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Semiconductor Production, Oxygen Analysis and Improving Wafer Yield

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Nearly all electronics processing involving gases takes place inside chambers that require precise control of the process recipe. As an example, oxygen and hydrogen are frequently used during the annealing process to react with existing layers, creating a new oxide or hydride layer on the surface of an existing thin film.

However, in some parts of the process recipe, oxygen can cause problems. In this case, eliminating atmospheric contamination of the gas-phase chemical reactions becomes a priority. That makes accurate measurement of trace O2 levels, which can also serve as a means to detect atmospheric leaks in the chamber, one of critical process parameters that must to be monitored and recorded. Knowing exactly what the oxygen levels are in the process will give you the information you need to ensure the highest quality and product performance.

That’s where we can help. Our trace O2 high purity analyzers feature a rapid-response zirconium oxide sensor and a measurement range of ppm to percent or ppb to percent O2. With this extremely fast response and high accuracy, these analyzers have the ability to measure O2 through large step changes in concentration and measure ppm concentrations of O2 within seconds after exposure to air.

Another way we can help is with room O2 deficiency monitoring. Nitrogen is the most widely used gas in electronics manufacturing. Although it can be used as a process gas, it is more commonly used for inerting and purging, including large amounts for purging vacuum systems and waste abatement systems. All that N2 can cause unsafe conditions should you have an upset condition.

Our O2 deficiency monitors can help you protect your workers by making certain that breathing air oxygen levels are safe. These percent O2 analyzers will closely monitor your workplace environment for health hazards associated with exposure to unsafe breathing air.

We are well aware of the challenges that you face when it comes to measuring critical process parameters and what it takes to meet your quality and safety goals. Through the expertise of our team, we are able to continue to help businesses operate smarter, safer, and more economically.

Whether you need to more closely monitor oxygen levels in your systems or protect your workers by making certain that breathing air levels are safe, you can rely on us.

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7100 Trace Oxygen Analyzer

The Neutronics 7100 Trace Oxygen Analyzer is a compact analyzer designed for trace oxygen gas measurement. This analyzer features a rapid-response mini-zirconia sensor with a measurement range of 0 to 1000 ppm oxygen. Extremely fast response, high accuracy, and no requirement for periodic calibrations make this analyzer a low-maintenance solution that delivers reliable performance for critical process control applications.

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3100 Percent Oxygen Analyzer

The Neutronics 3100 Percent Oxygen Analyzer is a compact analyzer that features the Neutronics rapid response zirconium oxide sensor and a measurement range of 0.1 ppm to 100% oxygen. With its extremely fast response time and high accuracy, the Model 3100 delivers reliable performance for a wide variety of oxygen gas measurement and critical process control applications.

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DTX832-HE Helium Analyzer

The Neutronics DTX832-He Helium in Air Analyzer is for helium in air measurement. With an Ethernet digital communication interface along with 4 to 20 mA output, this analyzer combines ease of use with simple installation, configuration, and integration into DCS and PLC control systems. Used with a well-proven thermal sensor technology that combines the sensor element, signal processing and digital calibration on one small chip, this helium analyzer is an ideal choice for demanding and cost sensitive process control applications.

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